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Effect of crystal structure on the background intensity in XRF
X-ray spectrometry 2005, vol. 34, no2, pp. 169-171
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http://dx.doi.org/10.1002/xrs.7802. Hassell DC, Bowman EM.
Process analytical chemistry for spectroscopists.
Appl Spectrosc. 1998; 52: 18A-29A.
3. H. W. Siesler
Application to Industrial Process Control
Near-Infrared Spectroscopy , Pages 247 - 268. 2002
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http://dx.doi.org/10.1002/9783527612666.ch11Consideration of some sampling problems in the on-line analysis of batch processes by low-field NMR spectrometry
Analyst, 2008, 133, 339 - 347,
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http://dx.doi.org/10.1039/b714266hAnalytical model for the Bremsstrahlung spectrum in the 0.25-38 keV range
Spectrochimica Acta Part B 59 (2004) 313-319
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