AIP:
1. Journal of Applied Physics, 21, #4, 301 (1950)
Effect of Change of Scale on Sintering Phenomena
Conyers Herring
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http://dx.doi.org/10.1063/1.16996582. Microelectronic Engineering Volume 81, Issue 1, July 2005, Pages 162-167
Roughness of amorphous/crystalline interface in pre-amorphization implantation: Molecular dynamic simulation and modeling
Min Yu, Rong Wang, Huihui Ji, Ru Huang, Xing Zhang, Yangyuan Wang, Jinyu Zhang and Hideki Oka
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http://dx.doi.org/10.1016/j.mee.2005.05.0033. Journal of Physics: Condensed Matter, 21, #22, 224021 (7pp)
Stress-enhanced pattern formation on surfaces during low energy ion bombardment
N V Medhekar et al
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http://dx.doi.org/10.1088/0953-8984/21/22/224021Simultaneous formation of two ripple modes on ion sputtered silicon
Adrian Keller, Steven Roßbach, Stefan Facsko and Wolfhard Möller
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http://dx.doi.org/10.1088/0957-4484/19/13/1353035. Physical Review B: Condensed Matter, 69, 245413 (2004) [6 pages]
Kinetics of ion-induced ripple formation on Cu(001) surfaces
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http://dx.doi.org/10.1103/PhysRevB.69.245413