Jpn. J. Appl. Phys. 37 (1998) pp. 2381-2387
Real-Time Monitoring and Control of Plasma Etching
Moshe Sarfaty, Chris Baum, Michael Harper, Noah Hershkowitz and Juda L. Shohet
- DOI:
http://dx.doi.org/10.1143/JJAP.37.2381
Код: Выделить всё
http://jjap.ipap.jp/link?JJAP/37/2381/