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ACS
1)
J. Phys. Chem. B 2004, 108 (28), pp 9900–9904
Deposition Mechanism of Ni on Si(100) Surfaces in Aqueous Alkaline Solution
Daisuke Niwa, Takayuki Homma, and Tetsuya Osaka*
Department of Applied Chemistry, School of Science and Engineering, Waseda University, 3-4-1 Okubo, Shinjuku-ku, Tokyo 169-8555, Japan

DOI:

http://dx.doi.org/10.1021/jp037159t

SceinceDirect
2)Surface Science Reports
Volume 62, Issue 12, 31 December 2007, Pages 499-525
Metallization and nanostructuring of semiconductor surfaces by galvanic displacement processes
Carlo Carraroa, Roya Maboudiana,

DOI:

http://dx.doi.org/10.1016/j.surfrep.2007.08.002

3)Sensors and Actuators B: Chemical
Volume 147, Issue 2, 3 June 2010, Pages 681-686
Palladium nanostructures from galvanic displacement as hydrogen peroxide sensor
Albert Gutesa, Corresponding , Ian Laboriantea, Carlo Carraroa, b and Roya Maboudian

DOI:

http://dx.doi.org/10.1016/j.snb.2010.03.084

4)Microelectronic Engineering
Volume 64, Issues 1-4, October 2002, Pages 479-485

DOI:

http://dx.doi.org/10.1016/S0167-9317(02)00824-9

Selective deposition of gold nanoclusters on silicon by a previous galvanic displacement process
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