1) Low‐pressure deposition of high‐quality SiO2 films by pyrolysis of tetraethylorthosilicate
F. S. Becker, D. Pawlik, H. Anzinger, and A. Spitzer
J. Vac. Sci. Technol. B 5, 1555 (1987)
- DOI:
http://dx.doi.org/10.1116/1.583673
Adachi, Motoaki; Okuyama, Kikuo; Tohge, Noboru; Shimada, Manabu; Satoh, Jun-ichi; Muroyama, Masakazu
Japanese Journal of Applied Physics, Volume 31, Issue 10A, pp. L1439-L1442 (1992)
- DOI:
http://dx.doi.org/10.1143/JJAP.31.L1439