1) tructure and Properties of Silicon Titanium Oxide Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Method
Takeshi Kamada, Masatoshi Kitagawa, Munehiro Shibuya and Takashi Hirao
Jpn. J. Appl. Phys. 30 (1991) pp. 3594-3596
- DOI:
http://dx.doi.org/10.1143/JJAP.30.3594
B. C. WEBER, P. S. HESSINGER
Journal of the American Ceramic Society
Volume 37, Issue 6, pages 267–272, June 1954
- DOI:
http://dx.doi.org/10.1111/j.1151-2916.1954.tb14035.x
M.A. Lamkin, F.L. Riley, and R.J. Fordham
Journal of the European Ceramic Society
Volume 10, Issue 5, 1992, Pages 347-367
- DOI:
http://dx.doi.org/10.1016/0955-2219(92)90010-B
Nicolas Martin, Christophe Rousselot, Daniel Rondot, Franck Palmino and René Mercier
Thin Solid Films
Volume 300, Issues 1-2, 28 May 1997, Pages 113-121
- DOI:
http://dx.doi.org/10.1016/S0040-6090(96)09510-7
5) Preparation and properties of TiO2–SiO2 (1 : 1) films prepared by a complexing agent-assisted sol–gel process
Toshikazu Nishide and Fujio Mizukami
Thin Solid Films
Volume 298, Issues 1-2, 20 April 1997, Pages 89-91
- DOI:
http://dx.doi.org/10.1016/S0040-6090(96)09140-7