++++4 статьи, SD

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1) Correlation between processing and properties of TiOxNy thin films sputter deposited by the reactive gas pulsing technique
N. Martin, O. Banakh, A. M. E. Santo, S. Springer, R. Sanjinés, J. Takadoum and F. Lévy
Applied Surface Science, Volume 185, Issues 1-2, 28 December 2001, Pages 123-133

DOI:

http://dx.doi.org/10.1016/S0169-4332(01)00774-7

2) Sol–gel preparation and characterization of anti-reflective and self-cleaning SiO2–TiO2 double-layer nanometric films
Ömer Kesmez, H. Erdem Çamurlu, Esin Burunkaya and Ertuğrul Arpaç
Solar Energy Materials and Solar Cells,Volume 93, Issue 10, October 2009, Pages 1833-1839

DOI:

http://dx.doi.org/10.1016/j.solmat.2009.06.022

3) Characterization and photocatalytic activity of TiO2 thin films prepared by RF magnetron sputtering
Fanming Meng and Fei Lu
Vacuum, Volume 85, Issue 1, 23 July 2010, Pages 84-88

DOI:

http://dx.doi.org/10.1016/j.vacuum.2010.04.006

4) Diffusion and chemical composition of TiNxOy thin films studied by Rutherford Backscattering Spectroscopy
K. Drogowska, N.-T.H. Kim-Ngan, A.G. Balogh, M. Radecka, A. Brudnik, K. Zakrzewska and Z. Tarnawski
Surface Science, Volume 604, Issues 11-12, 15 June 2010, Pages 1010-1014

DOI:

http://dx.doi.org/10.1016/j.susc.2010.03.010

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