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Comparison of CH, C3, CHF, and CF2 Surface Reactivities during Plasma-Enhanced Chemical Vapor Deposition of Fluorocarbon Films
Dongping Liu, Michael F. Cuddy and Ellen R. Fisher
ACS Appl. Mater. Interfaces, 2009, 1 (4), pp 934–943
- DOI:
http://dx.doi.org/10.1021/am900034x