Помогите найти статьи из журнала Thin Solid Films

[толя]

Growth and characterization of nitrogen–doped TiO2 thin films prepared by reactive pulsed laser deposition Original Research Article
Thin Solid Films, Volume 519, Issue 4, 1 December 2010, Pages 1464-1469
G. Sauthier, F.J. Ferrer, A. Figueras, E. György

X-ray photoelectron spectroscopy analyses of titanium oxynitride films prepared by magnetron sputtering using air/Ar mixtures Original Research Article
Thin Solid Films, Volume 517, Issue 17, 1 July 2009, Pages 5006-5009
Mu-Hsuan Chan, Fu-Hsing Lu

Formation of oxynitrides on titanium alloys by gas diffusion treatment Original Research Article
Thin Solid Films, Volume 519, Issue 19, 29 July 2011, Pages 6508-6514
O.I. Yaskiv, I.M. Pohrelyuk, V.M. Fedirko, Dong Bok Lee, O.V. Tkachuk

In-situ electrical characterization of ultrathin TiN films grown by reactive dc magnetron sputtering on SiO2 Original Research Article
Thin Solid Films, Volume 517, Issue 24, 30 October 2009, Pages 6731-6736
A.S. Ingason, F. Magnus, J.S. Agustsson, S. Olafsson, J.T. Gudmundsson

Growth and characterization of nitrogen–doped TiO2 thin films prepared by reactive pulsed laser deposition Original Research Article
Thin Solid Films, Volume 519, Issue 4, 1 December 2010, Pages 1464-1469
G. Sauthier, F.J. Ferrer, A. Figueras, E. György

Characterization of TiN films prepared by a conventional magnetron sputtering system: influence of nitrogen flow percentage and electrical properties Original Research Article
Thin Solid Films, Volume 287, Issues 1-2, 30 October 1996, Pages 115-119
M. Kawamura, Y. Abe, H. Yanagisawa, K. Sasaki

[tyler111]

Читаем правила !