1. Growth mechanisms of MOCVD processed Ni thin films
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J. Phys. IV France, Volume 09, Number PR8, September 1999, Proceedings of the Twelfth European Conference on Chemical Vapour Deposition, pages Pr8-57 - Pr8-64
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http://dx.doi.org/10.1051/jp4:1999807
D. de Caro, L. Brissonneau, D. Boursier, R. Madar and C. Vahlas
J. Phys. IV France, Volume 09, Number PR8, September 1999, Proceedings of the Twelfth European Conference on Chemical Vapour Deposition, pages Pr8-1099 - Pr8-1106
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http://dx.doi.org/10.1051/jp4:19998137
L. Brissonneau, A. Kacheva, F. Senocq, J.-K. Kang, S.-W. Rhee, A. Gleizes and C. Vahlas
J. Phys. IV France, Volume 09, Number PR8, September 1999, Proceedings of the Twelfth European Conference on Chemical Vapour Deposition, pages Pr8-597 - Pr8-604
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http://dx.doi.org/10.1051/jp4:1999875
H. Gavrila, V. Ionita and W. Kappel
J. Phys. IV France, Volume 08, Number PR2, June 1998, Soft Magnetic Materials 13, pages Pr2-347 - Pr2-350
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http://dx.doi.org/10.1051/jp4:1998281
M. Becht, J. Gallus, M. Hunziker, F. Atamny and K.-H. Dahmen
J. Phys. IV France, Volume 05, Number C5, Juin 1995, Proceedings of the Tenth European Conference on Chemical Vapour Deposition, pages C5-465 - C5-472
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http://dx.doi.org/10.1051/jphyscol:1995553