++++4 статьи JVST, 1 статья Ingenta(JNN)_Спасибо_tyler111

[primavera]

Добрый день! Помогите, пожалуйста достать статьи:

1)J. Vac. Sci. Technol. A 18, 2619 (2000);
Plasma deposition of optical films and coatings: A review
Ludvik Martinu and Daniel Poitras

DOI:

http://dx.doi.org/10.1116/1.1314395

2) J. Vac. Sci. Technol. A 3, 867 (1985);
Remote plasma enhanced CVD deposition of silicon nitride and oxide for gate insulators in (In, Ga)As FET devices
P. D. Richard, R. J. Markunas, G. Lucovsky, G. G. Fountain, A. N. Mansour, and D. V. Tsu

DOI:

http://dx.doi.org/10.1116/1.573334

3)J. Vac. Sci. Technol. B 14, 2674 (1996);
Gate quality Si3N4 prepared by low temperature remote plasma enhanced chemical vapor deposition for III–V semiconductor‐based metal–insulator–semiconductor devices
D. G. Park, M. Tao, D. Li, A. E. Botchkarev, Z. Fan, Z. Wang, S. N. Mohammad, A. Rockett, J. R. Abelson, H. Morkoç, A. R. Heyd, and S. A. Alterovitz

DOI:

http://dx.doi.org/10.1116/1.589003

4) J. Vac. Sci. Technol. A 16, 2794 (1998);
Low temperature plasma deposition of silicon nitride from silane and nitrogen plasmas
Bengi F. Hanyaloglu and Eray S. Aydil

DOI:

http://dx.doi.org/10.1116/1.581424

5) Journal of Nanoscience and Nanotechnology, Volume 8, Number 10, October 2008 , pp. 5363-5366(4)
Kim, Byungwhan; Kim, Suyean; Seo, Yong Ho; Kim, Dong Hwan; Kim, Sun Jae; Jung, Sang Chul
Surface Morphology of SiN Film Deposited by a Pulsed-Plasma Enhanced Chemical Vapor Deposition at Room Temperature

DOI:

http://dx.doi.org/10.1166/jnn.2008.1342

Заранее спасибо!

[tyler111]

[primavera]

Большое спасибо! )))