SD
1) Nitrogen radical densities during GaN growth by molecular beam epitaxy, plasma-assisted metalorganic chemical vapor deposition, and conventional metalorganic chemical vapor deposition
Michio Sato
Solid-State Electronics, Volume 41, Issue 2, February 1997 , Pages 223-226
- DOI:
http://dx.doi.org/10.1016/S0038-1101(96)00171-2
2) Growth and Characterization of Thin Films and Patterned Substrates of III-V Nitrides on SiC (0001) Substrates
Robert F. Davis et al., 1998, Materials Science Forum, 264-268, 1111
- DOI:
http://dx.doi.org/10.4028/www.scientific.net/MSF.264-268.1111
Urban Forsberg et al., 1998, Materials Science Forum, 264-268, 1133
- DOI:
http://dx.doi.org/10.4028/www.scientific.net/MSF.264-268.1133
A. Strittmatter et al., 1998, Materials Science Forum, 264-268, 1145
- DOI:
http://dx.doi.org/10.4028/www.scientific.net/MSF.264-268.1145
J. Edmond et al., 1998, Materials Science Forum, 264-268, 1421
- DOI:
http://dx.doi.org/10.4028/www.scientific.net/MSF.264-268.1421